| 发明名称 |
LITHOGRAPHIC SYSTEM |
| 摘要 |
A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source. |
| 申请公布号 |
US2017052456(A1) |
申请公布日期 |
2017.02.23 |
| 申请号 |
US201515119100 |
申请日期 |
2015.01.23 |
| 申请人 |
ASML Netherlands B.V. |
发明人 |
VAN SCHOOT Jan Bernard Plechelmus;CUPERUS Minne;YAKUNIN Andrei Mikhailovich |
| 分类号 |
G03F7/20;H05G2/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithographic system comprising:
a lithographic apparatus with an anamorphic projection system; and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source. |
| 地址 |
Veldhoven NL |
