| 发明名称 |
ENVIRONMENTAL-SURROUNDING-AWARE OPC |
| 摘要 |
The present disclosure provides a method of performing optical proximity correction (OPC). An integrated circuit (IC) design layout is received. The design layout contains a plurality of IC layout patterns. Two or more of the plurality of IC layout patterns are grouped together. The grouped IC layout patterns are dissected, or target points are set for the grouped IC layout patterns. Thereafter, an OPC process is performed based on the grouped IC layout patterns. |
| 申请公布号 |
US2017053055(A1) |
申请公布日期 |
2017.02.23 |
| 申请号 |
US201514831926 |
申请日期 |
2015.08.21 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
Cheng Wen-Li;Chih Ming-Hui;Liu Ru-Gun;Huang Wen-Chun |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of performing optical proximity correction (OPC), comprising:
receiving an integrated circuit (IC) design layout, the design layout containing a plurality of IC layout patterns; grouping two or more of the plurality of IC layout patterns; dissecting or setting target points for the grouped IC layout patterns; and thereafter performing an OPC process based on the grouped IC layout patterns. |
| 地址 |
Hsin-Chu TW |
