发明名称 WAFER PROCESSING METHOD
摘要 A wafer processing method of processing a wafer with a plurality of devices disposed in areas demarcated by projected division lines and formed on a face side thereof includes a protective member placing step of placing a protective member for protecting the face side of the wafer on the face side of the wafer which is divided into individual device chips, a resin laying step of laying a die-bonding resin on the reverse sides of the individual device chips by applying a die-bonding liquid resin on the reverse side of the wafer and hardening the applied die-bonding liquid resin, and a separation step of separating the device chips with the die-bonding liquid resin laid on the reverse sides thereof from the wafer.
申请公布号 US2017053830(A1) 申请公布日期 2017.02.23
申请号 US201615234587 申请日期 2016.08.11
申请人 DISCO CORPORATION 发明人 Haimoto Takashi;Koshimizu Hideki;Araya Yurika;Sugiya Tetsukazu
分类号 H01L21/78;H01L21/268;H01L21/306;H01L21/304;H01L23/544;H01L21/683 主分类号 H01L21/78
代理机构 代理人
主权项 1. A wafer processing method of processing a wafer with a plurality of devices formed in areas demarcated by projected division lines on a face side thereof, comprising: a protective member placing step of placing a protective member for protecting the face side of the wafer on the face side of the wafer which is divided into individual device chips; a resin laying step of laying a die-bonding resin on the reverse sides of the individual device chips by applying a die-bonding liquid resin on the reverse side of the wafer and hardening the applied die-bonding liquid resin; and a separating step of separating the device chips with the die-bonding liquid resin laid on the reverse sides thereof from the wafer.
地址 Tokyo JP