发明名称 MEASURING METHOD FOR ATOMIC FORCE MICROSCOPE
摘要 Provided is a measuring method for an atomic force microscope that scans a surface of a sample with a probe to measure a surface property of the sample, the measuring method including detecting a motion of the probe while vibrating the probe on the surface of the sample, acquiring surface information on the sample by using a variation in the motion of the probe, and controlling the probe by using the surface information on the sample. The surface information on the sample may include a position and a slope of the surface. The vibrating of the probe on the surface of the sample may include performing a circular motion by the probe around axes perpendicular to a scan direction of the probe and to a height direction of the sample.
申请公布号 US2017052210(A1) 申请公布日期 2017.02.23
申请号 US201615238326 申请日期 2016.08.16
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE 发明人 PARK Byong Chon;KIM DalHyun;SHIN ChaeHo
分类号 G01Q20/00 主分类号 G01Q20/00
代理机构 代理人
主权项 1. A measuring method for an atomic force microscope that scans a surface of a sample with a probe to measure a surface property of the sample, the measuring method comprising: detecting a motion of the probe while vibrating the probe on the surface of the sample; acquiring surface information on the sample by using a variation in the motion of the probe wherein the surface information on the sample comprises a position and a slope of the surface; and controlling the probe by using the surface information on the sample, wherein the vibrating of the probe on the surface of the sample comprises performing a circular motion by the probe around axes perpendicular to a scan direction of the probe and to a height direction of the sample.
地址 Daejeon KR
您可能感兴趣的专利