发明名称 |
PELLICLE FRAME, PELLICLE CONTAINING SAME, METHOD FOR PRODUCING PELLICLE FRAME, AND METHOD FOR PRODUCING PELLICLE |
摘要 |
The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas or foreign substance; and a pellicle which uses this pellicle frame. In order to achieve the above-described purpose, this pellicle frame for supporting the outer periphery of a pellicle film is configured to comprise a frame and a film that is formed on the surface of the frame and contains a polyimide resin. |
申请公布号 |
WO2017030109(A1) |
申请公布日期 |
2017.02.23 |
申请号 |
WO2016JP73828 |
申请日期 |
2016.08.15 |
申请人 |
MITSUI CHEMICALS, INC. |
发明人 |
KOHMURA, Kazuo;KOZEKI, Takashi;TANEICHI, Daiki;MAEKAWA, Shintaro;ONO, Yosuke;BIYAJIMA, Tsuneaki;ISHITO, Nobuyuki |
分类号 |
G03F1/64 |
主分类号 |
G03F1/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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