PROJECTION EXPOSURE APPARATUS WITH NEAR-FIELD MANIPULATOR

摘要

A semiconductor lithography projection exposure apparatus includes a projection lens which includes a manipulator. The manipulator includes an optical element; a base frame; a sensor frame arranged on the base frame; and a sensor arranged on the sensor frame. The manipulator is configured to correct wavefront aberrations of used optical radiation that pass through the optical element during the operation of the projection lens. The manipulator is arranged directly after an object plane of the apparatus along a path of the used optical radiation. The sensor is configured to measure a deformation or a deflection of the optical element. A coefficient of thermal expansion of the sensor frame is within 16 ppm/K of a coefficient of thermal expansion of the base frame.

主权项

1. An apparatus, comprising:
a projection lens comprising a manipulator, the manipulator comprising:
an optical element;a base frame;a sensor frame arranged on the base frame; anda sensor arranged on the sensor frame, wherein:
the manipulator is configured to correct wavefront aberrations of used optical radiation that pass through the optical element during the operation of the projection lens;the manipulator is arranged directly after an object plane of the apparatus along a path of the used optical radiation;the sensor is configured to measure a deformation or a deflection of the optical element;a coefficient of thermal expansion of the sensor frame is within 16 ppm/K of a coefficient of thermal expansion of the base frame; and wherein the apparatus is a semiconductor lithography projection exposure apparatus.