| 摘要 |
Provided is a color solid-state image capture element of which a microlens can be easily manufactured in an appropriate film thickness and shape for the individual colors of colored transparent material. On a color filter (7) constituting the color solid-state image capture element, a transparent resin layer (8) with a different height is formed on a pixel by pixel basis. On the transparent resin layer (8), patterning is performed by photolithography using a photomask (12) having a density gradation in the microlens pattern, whereby a convex microlens (6) having a different lens height is formed on each pixel of the color filter (7) using a single pattern design. |
