| 摘要 |
Provided are: a pattern forming method which exhibits high sensitivity and high resolving power during the formation of an ultrafine pattern; a method for manufacturing an electronic device; and a resist composition. This pattern forming method comprises: a step (1) wherein a film is formed using an active light sensitive or radiation sensitive resin composition that contains (A) a resin which contains a repeating unit represented by general formula (1) in the description and having a ClogP value of 2.2 or less, and the solubility of which in a developer liquid containing an organic solvent is decreased by the action of an acid, (B) a compound which generates an acid when irradiated with active light or radiation, and (C) a solvent; a step (2) wherein the film is exposed to active light or radiation; and a step (3) wherein a negative pattern is formed by developing the film, which has been exposed to light in the step (2), with use of a developer liquid containing an organic solvent. |
