| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion source which improves efficiency of cleaning performed in a high-frequency type ion source.SOLUTION: An ion source IS generates plasma P in a plasma chamber 1 by using a high-frequency power supply Vh, and extracts an ion beam IB from the plasma P by using an extraction electrode system 2 consisting of a plurality of electrodes arranged adjacently to the plasma chamber 1. In cleaning, a cleaning gas is introduced into the plasma chamber 1, while the high-frequency power supply Vh is connected to the plasma chamber 1, and a bias power supply Vb is connected between the plasma chamber 1 and any of the electrodes constituting the extraction electrode system 2. |
