发明名称 |
COMPOSITION FOR POLISHING SILICON WAFERS |
摘要 |
Provided is a silicon wafer polishing composition having an excellent effect of reducing the haze on the surface of silicon wafers and excellent filterability. The composition for polishing silicon wafers provided here includes a silicon-wafer polishing accelerator, an amido group-containing polymer X, an organic compound Y having no amido group, and water. The amido group-containing polymer X has, on the main chain, a building block A derived from a monomer represented by General Formula (1). The relation between the molecular weight M x of the amido group-containing polymer X and the molecular weight M y of the organic compound Y satisfies the expression: 200 ‰¤ M y < M x . |
申请公布号 |
EP3133639(A1) |
申请公布日期 |
2017.02.22 |
申请号 |
EP20150780524 |
申请日期 |
2015.04.07 |
申请人 |
Fujimi Incorporated |
发明人 |
TSUCHIYA, Kohsuke;TANSHO, Hisanori;MORI, Yoshio |
分类号 |
H01L21/304;B24B37/00;C09K3/14;H01L21/321 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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