发明名称 DETECTION APPARATUS, MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
摘要 The present invention provides a detection apparatus which causes light to be incident obliquely on a substrate (3) including a plurality of layers whose refractive indices are different from each other and detects a height of the substrate using light reflected from the substrate, the apparatus comprising an optical system (41a) including a polarizer (41a 1 ) for reducing s-polarized light and configured to cause light, in which s-polarized light has been reduced by the polarizer, to be incident on the substrate at an angle of incidence within a range of 40° to 55°.
申请公布号 EP3088957(A3) 申请公布日期 2017.02.22
申请号 EP20160000707 申请日期 2016.03.24
申请人 Canon Kabushiki Kaisha 发明人 Maeda, Hironori
分类号 G03F9/00 主分类号 G03F9/00
代理机构 代理人
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