发明名称 Computer program product and method of controlling polishing of a substrate
摘要 A method of controlling polishing includes polishing a substrate of a non-metallic layer undergoing polishing and a metal layer underlying the non-metallic layer; storing a metal reference spectrum, the metal reference spectrum being a spectrum of light reflected from a same metal material as the metal layer; measuring a sequence of raw spectra of light reflected from the substrate during polishing with an in-situ optical monitoring system; normalizing each raw spectrum in the sequence of spectra to generate a sequence of normalized spectra, of which normalizing includes a division operation where the measured spectrum is in the numerator and the metal reference spectrum is in the denominator; and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on at least one normalized predetermined spectrum from the sequence of normalized spectra.
申请公布号 US9573242(B2) 申请公布日期 2017.02.21
申请号 US201414299728 申请日期 2014.06.09
申请人 Applied Materials, Inc. 发明人 David Jeffrey Drue
分类号 B24B37/013;B24B37/005;H01L21/304;B24B49/12;B24B49/04;G05B15/02;B24B37/04;B24B37/10;G01B11/06;G01J3/28;G01N21/55;G01N21/95;G01N21/84;H01L21/321 主分类号 B24B37/013
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. A computer program product for controlling polishing, the computer program product tangibly embodied in a non-transitory computer readable medium and comprising instructions to cause a processor to: receive from an in-situ optical monitoring system, during polishing of a substrate that includes a non-metallic first layer undergoing polishing, a semiconductor second layer, and a third layer between the non-metallic first layer and the semiconductor second layer, a sequence of raw spectra of light reflected from the substrate; store a reference spectrum, the reference spectrum being a spectrum of light reflected from a same material as the third layer; normalize each raw spectrum in the sequence of raw spectra to generate a sequence of normalized spectra, wherein the instructions to normalize include a division operation in which the raw spectrum is in the numerator and the reference spectrum is in the denominator; and determine at least one of a polishing endpoint or an adjustment for a polishing rate based on at least one normalized predetermined spectrum from the sequence of normalized spectra.
地址 Santa Clara CA US
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