Wavefront measurement method, shape measurement method, optical element manufacturing method, optical apparatus manufacturing method, program, and wavefront measurement apparatus

摘要

A wavefront measurement method includes the steps of causing object light to be incident on a Shack-Hartmann sensor, capturing a first spot image under image pickup conditions, calculating data of first spot positions that correspond to the first spot image, calculating second spot positions by simulating a second spot image on the basis of the image pickup condition and information of a travelling direction of diffracted light generated when the object light passes through the microlenses, and reducing detection errors of the spot positions by correcting the data of the first spot positions on the basis of data of the second spot positions including data of a detection error due to the diffracted light.

主权项

1. A wavefront measurement method comprising steps of:
causing object light to be incident on a Shack-Hartmann sensor, which includes an image sensor and a microlens array including a plurality of microlenses, and capturing a first spot image under image pickup conditions; calculating, based on the first spot image, data of first spot positions that correspond to the first spot image; simulating a second spot image based on the image pickup conditions and information of a travelling direction of diffracted light generated when the object light passes through the microlenses; calculating second spot positions that correspond to the second spot image; and correcting the data of the first spot positions based on data of the second spot positions including data of a detection error due to the diffracted light, and calculating data of a wavefront of the object light.