发明名称 |
Confocal laser scanning microscope having a laser light source to which pulsed control is applied |
摘要 |
The present invention relates to a confocal laser scanning microscope (100) having an illumination device (1) that comprises a laser light source (41) that is configured to illuminate a sample (25), and a control application circuit (40) for the laser light source (1) which is configured to output a pulsed control application signal (48) in order to supply the laser light source (41), the control application circuit (40) being configured so that it determines both a pulse amplitude (A) and a pulse width (W) of at least one pulse of the pulsed control application signal (48) as a function of at least one input variable (S). |
申请公布号 |
US9575300(B2) |
申请公布日期 |
2017.02.21 |
申请号 |
US201314426260 |
申请日期 |
2013.09.04 |
申请人 |
Leica Microsystems CMS GmbH |
发明人 |
Widzgowski Bernd |
分类号 |
G02B21/00 |
主分类号 |
G02B21/00 |
代理机构 |
Hodgson Russ LLP |
代理人 |
Hodgson Russ LLP |
主权项 |
1. A confocal laser scanning microscope having an illumination device that comprises a laser light source that is configured to illuminate a sample, and a control application circuit for the laser light source which is configured to output a pulsed control application signal in order to supply the laser light source,
the control application circuit being configured so that it determines both a pulse amplitude and a pulse width of at least one pulse of the pulsed control application signal as a function of at least one input variable, the control application circuit comprising at least one of the following:
(i) an input for receiving an input signal, the control application circuit being configured to generate the pulsed control application signal such that the pulsed control application signal has a frequency dependent on the input signal present at the input; and(ii) an output for sending an output signal, the control application circuit being configured to generate the output signal such that the output signal has a frequency that depends on a frequency of the pulsed control application signal. |
地址 |
Wetzlar DE |