发明名称 Non-volatile memory device and method of fabricating the same
摘要 A non-volatile memory device may include a control plug formed over a substrate. A floating gate may be formed over the substrate, the floating gate surrounding the control plug and being separated from the control plug by a gap. A first charge blocking layer may be formed over sidewalls of the floating gate to fill the gap.
申请公布号 US9577059(B2) 申请公布日期 2017.02.21
申请号 US201314056542 申请日期 2013.10.17
申请人 SK Hynix Inc. 发明人 Park Sung-Kun
分类号 H01L29/423;H01L29/788;H01L27/115 主分类号 H01L29/423
代理机构 IP & T Group LLP 代理人 IP & T Group LLP
主权项 1. A non-volatile memory device comprising: an isolation layer formed in a substrate to define an active region; a control plug formed over the isolation layer; a floating gate formed over the isolation layer and being separated from the control plug by a first gap, and the floating gate extending over the active region; a junction region formed in the active region and on both sides of the floating gate; and contact plugs formed over the junction regions, where each of the contact plugs is separated from the floating gate by a second gap and a width of the first gap is smaller than a width of the second gap, wherein the control plug only overlaps with the isolation layer and the floating gate overlaps with both the isolation layer and the active region, and the floating gate is bent to have a first portion which extends in a first direction and a second portion which is in contact with the first portion and extends in a second direction crossing the first direction, where the first portion and the second portion of the floating gate face different sidewalls of the control plug, respectively.
地址 Gyeonggi-do KR