Illumination system for a microlithographic projection exposure apparatus

摘要

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

主权项

1. An optical system, comprising:
an optical integrator configured so that, when light is incident thereon, the optical integrator produces secondary light sources; a first scattering structure arranged, along a light propagation direction of the system, in front of the optical integrator, the first scattering structure comprising first subelements configured to introduces a divergence of incident light only in one direction; and a second scattering structure arranged, along a light propagation direction of the system, behind the optical integrator, the second scattering structure comprising second subelements configured to introduce a divergence of incident light in two directions, wherein the system is a microlithographic illumination system.