发明名称 Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device
摘要 Provided is a photosensitive resin composition which comprises: (A-1) a resin containing a structure represented by general formula (1); and (B) a photo-acid generating agent. In general formula (1), X, R1 to R7, m1 to m4, n1, n2, Y and W are each as defined in the description.;
申请公布号 US9575410(B2) 申请公布日期 2017.02.21
申请号 US201214363557 申请日期 2012.12.06
申请人 ASAHI KASEI E-MATERIALS CORPORATION 发明人 Shibui Satoshi;Hirata Tatsuya;Sasaki Takahiro;Yamada Taisuke
分类号 G03F7/038;G03F7/039;G03F7/004;C08L65/00;G03F7/023;C08G8/22;C08G16/02;C08L61/12;G03F7/022;C08G61/12;G03F7/30;C08G61/02 主分类号 G03F7/038
代理机构 Greenblum & Bernstein, P.L.C. 代理人 Greenblum & Bernstein, P.L.C.
主权项 1. A photosensitive resin composition comprising: (A-1) a resin containing a structure represented by following formula (1) and (B) a photoacid generator: wherein in formula (1), each X is independently a monovalent group selected from the group consisting of a hydrogen atom, an alkoxycarbonyl group having a carbon number of 2 to 20, an alkoxycarbonylmethyl group having a carbon number of 2 to 20, an alkoxyalkyl group having a carbon number of 2 to 20, a silyl group substituted with at least one alkyl group having a carbon number of 1 to 10, a tetrahydropyranyl group, and a tetrahydrofuranyl group; each m1 is independently an integer of 1 to 3, each m2 is independently an integer of 0 to 2, and 2≦(m1+m2)≦4; each of m3 and m4 is independently an integer of 0 to 4; each of n1 and n2 is independently an integer of 1 to 500, and n1/(n1+n2) is from 0.35 to 0.95; each R1 is independently a monovalent group selected from the group consisting of a hydrocarbon group having a carbon number of 1 to 10, an alkoxy group having a carbon number of 1 to 10, a nitro group, a cyano group, and a group represented by following formula (5) or (6); when m2 is 2, the plurality of R1 may be the same as or different from each other; each of R2 to R5 is independently a hydrogen atom, a monovalent aliphatic group having a carbon number of 1 to 10, or a monovalent aliphatic group having a carbon number of 1 to 10, in which some hydrogen atoms or all hydrogen atoms are substituted with a fluorine atom; each of R6 and R7 is independently a halogen atom, a hydroxyl group or a monovalent organic group; when m3 is an integer of 2 to 4, the plurality of R6 may be the same as or different from each other; when m4 is an integer of 2 to 4, the plurality of R7 may be the same as or different from each other; Y is a divalent organic group represented by following formula (3) or (4); W is a divalent group selected from the group consisting of a single bond, a chain aliphatic group having a carbon number of 1 to 10, a chain aliphatic group having a carbon number of 1 to 10, in which some hydrogen atoms or all hydrogen atoms are substituted with a fluorine atom, an alicyclic group having a carbon number of 3 to 20, an alicyclic group having a carbon number of 3 to 20, in which some hydrogen atoms or all hydrogen atoms are substituted with a fluorine atom, an alkylene oxide group having from 1 to 20 repeating units, and groups represented by following formula (2): and the polymer structure may be a random structure or a block structure; —CR8R9—  (3) wherein in formula (3), each of R8 and R9 is independently a hydrogen atom, a monovalent organic group having a carbon number of 1 to 11, or a group containing a carboxyl group, a sulfonic acid group or a phenolic hydroxyl group; wherein in formula (4), each of R11 to R14 is independently a hydrogen atom, a monovalent aliphatic group having a carbon number of 1 to 10, or a monovalent aliphatic group having a carbon number of 1 to 10, in which some hydrogen atoms or all hydrogen atoms are substituted with a fluorine atom; m5 is an integer of 1 to 4; when m5 is 1, R10 is a hydroxyl group, a carboxyl group or a sulfonic acid group, and when m5 is an integer of 2 to 4, at least one R10 is a hydroxyl group and the remaining R10 are a halogen atom, a hydroxyl group, a monovalent organic group, a carboxyl group or a sulfonic acid group; and all R10 may be the same or different; wherein in formula (5), R15 is a monovalent group selected from the group consisting of a hydroxyl group, an aliphatic group having a carbon number of 1 to 12, an alicyclic group having a carbon number of 3 to 12, an aromatic group having a carbon number of 6 to 18, —NH2, and groups represented by —NH—R19, —N(R19)2 and —O—R19 wherein R19 is a monovalent group selected from an aliphatic group having a carbon number of 1 to 12, an alicyclic group having a carbon number of 3 to 12, and an aromatic group having a carbon number of 6 to 18; wherein in formula (6), each of R16 and R17′ is independently a monovalent group selected from the group consisting of a hydrogen atom, an aliphatic group having a carbon number of 1 to 12, an alicyclic group having a carbon number of 3 to 12, and an aromatic group having a carbon number of 6 to 18, and R16 and R17′ may form a ring.
地址 Tokyo JP