Apparatus for transferring a substrate in a lithography system

摘要

An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

主权项

1. An apparatus for transferring a target from a substrate transfer system to a vacuum chamber of a lithography system, the target comprising a substrate or a substrate support structure onto which a substrate has been clamped, the apparatus comprising:
a load lock chamber for transferring the target into and out of the vacuum chamber of the lithography system, the load lock chamber comprising a first wall having a first passage therein providing access between a robot space and the interior of the load lock chamber, and a second wall having a second passage therein providing access between the interior of the load lock chamber and the vacuum chamber of the lithography system; and a plurality of handling robots for transferring the targets,wherein the plurality of handling robots comprises:
a first handling robot movable within the robot space to access the substrate transfer system and the first passage of the load lock chamber; and a second handling robot movable within the load lock chamber to access the first passage of the load lock chamber and the second passage of the load lock chamber for access to the vacuum chamber of the lithography system.