发明名称 |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD |
摘要 |
An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ). |
申请公布号 |
HK1091596(A1) |
申请公布日期 |
2017.02.17 |
申请号 |
HK20060112678 |
申请日期 |
2006.11.17 |
申请人 |
NIKON CORPORATION |
发明人 |
KOBAYASHI, Naoyuki;OWA, Soichi;HIRUKAWA, Shigeru;OMURA, Yasuhiro |
分类号 |
H01L;G03F;G03F7/20;H01L21/027 |
主分类号 |
H01L |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|