VAPOR DEPOSITION SOURCE, VAPOR DEPOSITION DEVICE, AND METHOD FOR FORMING FILM BY VAPOR DEPOSITION

摘要

A vapor deposition particle ejecting unit (30) in a vapor deposition source (10) is provided with: a plurality of levels of nozzle units that are vertically stacked apart from each other, each of which nozzle units having at least one vapor deposition nozzle (32, 52); and at least one spacer (43) provided between the vapor deposition nozzles on the respective levels. The four sides of the spacers are surrounded by side walls (44) to which are provided at least one opening (45) for connecting the spacers and a vacuum chamber space (2a).