发明名称 |
RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME |
摘要 |
A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent.;;(wherein R1 is a C1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R2 is a hydrogen atom, a C1-6 alkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a C1-6 alkyl group optionally having a substituent, R3 is a hydrogen atom, a C1-6 alkyl group, hydroxy group, or halogeno group, R4 is a direct bond or divalent C1-8 organic group, R5 is a divalent C1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.) |
申请公布号 |
US2017045820(A1) |
申请公布日期 |
2017.02.16 |
申请号 |
US201515305793 |
申请日期 |
2015.04.14 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
SAKAIDA Yasushi;NISHITA Tokio;FUJITANI Noriaki;SAKAMOTO Rikimaru |
分类号 |
G03F7/11;G03F7/004;H01L21/308;G03F7/16;G03F7/26;C09D179/08;G03F7/20 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
1. A resist underlayer film-forming composition for lithography containing a polymer having a structure of Formula (1) or (2) below at a terminal of a polymer chain, a crosslinker, a compound promoting a crosslinking reaction, and an organic solvent. (wherein R1 is a C1-6 alkyl group optionally having a substituent, a phenyl group, a pyridyl group, a halogeno group, or a hydroxy group, R2 is a hydrogen atom, a C1-6 alkyl group, a hydroxy group, a halogeno group, or an ester group of —C(═O)O—X wherein X is a C1-6 alkyl group optionally having a substituent, R3 is a hydrogen atom, a C1-6 alkyl group, a hydroxy group, or a halogeno group, R4 is a direct bond or a divalent C1-8 organic group, R5 is a divalent C1-8 organic group, A is an aromatic ring or a heteroaromatic ring, t is 0 or 1, and u is 1 or 2.) |
地址 |
Tokyo JP |