MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD

摘要

A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

主权项

1. A multi charged particle beam writing apparatus comprising:
a writing mechanism configured to include a stage, being movable, for mounting a target object serving as a writing target thereon, and to write a pattern on the target object with multi-beams of a charged particle beam; a maximum irradiation time acquisition processing circuitry configured to acquire, for each shot of the multi-beams, a maximum irradiation time of irradiation time of each beam of the multi-beams; a unit region writing time calculation processing circuitry configured to calculate, using the maximum irradiation time for the each shot, a unit region writing time by totalizing the maximum irradiation time of the each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned while the stage is moved, for each unit region of a plurality of unit regions obtained by dividing a writing region of the target object; a stage speed calculation processing circuitry configured to calculate a speed of the stage for the each unit region so that the speed of the stage becomes variable, by using the unit region writing time; and a stage control processing circuitry configured to variably control the speed of the stage.