MAGNETIZED EDGE RING FOR EXTREME EDGE CONTROL

摘要

An apparatus, for treating a substrate in a plasma processing chamber with an electromagnet power source with leads. An edge ring body surrounds the substrate. An electromagnet is embedded within or attached to a surface of the edge ring body, extending more than half way around the edge ring, wherein the electromagnet is configured to provide a magnetic flux greater than 0.1 mTesla along more than half of an outer edge of the substrate, wherein the electromagnet comprises at least one winding, wherein the leads of the electromagnet power source are electrically connected to the at least one winding.

主权项

1. An apparatus, for treating a substrate in a plasma processing chamber with an electromagnet power source with leads, comprising:
an edge ring body surrounding the substrate; and an electromagnet embedded within or attached to a surface of the edge ring body, extending more than half way around the edge ring, wherein the electromagnet is configured to provide a magnetic flux greater than 0.1 mTesla along more than half of an outer edge of the substrate, wherein the electromagnet comprises at least one winding; wherein the leads of the electromagnet power source are electrically connected to the at least one winding.