发明名称 |
BUFFER LAYER FILM-FORMING METHOD AND BUFFER LAYER |
摘要 |
The present invention relates to a method for film-forming a buffer layer to be used for a solar cell, the buffer layer being disposed between a light absorbing layer and a transparent conductive film. Specifically, in this buffer layer film-forming method, a solution (4) is formed into a mist, the solution containing zinc and aluminum as metal raw materials of the buffer layer. Then, a substrate (2) disposed in the atmosphere is heated. Then, the mist of the solution is sprayed to the substrate being heated. |
申请公布号 |
US2017047472(A1) |
申请公布日期 |
2017.02.16 |
申请号 |
US201415305397 |
申请日期 |
2014.05.22 |
申请人 |
TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION |
发明人 |
SHIRAHATA Takahiro;ORITA Hiroyuki;HIRAMATSU Takahiro;KOBAYASHI Hiroshi |
分类号 |
H01L31/18;H01L31/0224 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
1. A method for film-forming a buffer layer to be used for a solar cell, the buffer layer being disposed between a light absorbing layer and a transparent conductive film comprising the steps of:
(A) forming a solution (4) containing zinc and aluminum as metal raw materials of the buffer layer into a mist, (B) heating a substrate (2) disposed in the atmosphere, and (C) spraying a mist of said solution atomized in said step (A) to said substrate in said step (B). |
地址 |
Chuo-ku JP |