发明名称 BUFFER LAYER FILM-FORMING METHOD AND BUFFER LAYER
摘要 The present invention relates to a method for film-forming a buffer layer to be used for a solar cell, the buffer layer being disposed between a light absorbing layer and a transparent conductive film. Specifically, in this buffer layer film-forming method, a solution (4) is formed into a mist, the solution containing zinc and aluminum as metal raw materials of the buffer layer. Then, a substrate (2) disposed in the atmosphere is heated. Then, the mist of the solution is sprayed to the substrate being heated.
申请公布号 US2017047472(A1) 申请公布日期 2017.02.16
申请号 US201415305397 申请日期 2014.05.22
申请人 TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION 发明人 SHIRAHATA Takahiro;ORITA Hiroyuki;HIRAMATSU Takahiro;KOBAYASHI Hiroshi
分类号 H01L31/18;H01L31/0224 主分类号 H01L31/18
代理机构 代理人
主权项 1. A method for film-forming a buffer layer to be used for a solar cell, the buffer layer being disposed between a light absorbing layer and a transparent conductive film comprising the steps of: (A) forming a solution (4) containing zinc and aluminum as metal raw materials of the buffer layer into a mist, (B) heating a substrate (2) disposed in the atmosphere, and (C) spraying a mist of said solution atomized in said step (A) to said substrate in said step (B).
地址 Chuo-ku JP