发明名称 SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATION OF METROLOGY TOOLS
摘要 A system, method and computer program product are provided for calibrating metrology tools. One or more design-of-experiments wafers is received for calibrating a metrology tool. A set of signals is collected by measuring the one or more wafers utilizing the metrology tool. A first transformation is determined to convert the set of signals to components, and a second transformation is determined to convert a set of reference signals to reference components. The set of reference signals is collected by measuring the one or more wafers utilizing a well-calibrated reference tool. A model is trained based on the reference components that maps the components to converted components, and the model, first transformation, and second transformation are stored in a memory associated with the metrology tool.
申请公布号 US2017045356(A1) 申请公布日期 2017.02.16
申请号 US201615236334 申请日期 2016.08.12
申请人 KLA-Tencor Corporation 发明人 Pandev Stilian Ivanov;Sanko Dzmitry
分类号 G01B21/00 主分类号 G01B21/00
代理机构 代理人
主权项 1. A method, comprising: receiving one or more DoE (design-of-experiments) wafers for calibrating a metrology tool; collecting a set of signals by measuring the one or more DoE wafers utilizing the metrology tool; determining a first transformation to convert the set of signals to components; determining a second transformation to convert a set of reference signals to reference components; training a model, based on the reference components, that maps the components to converted components; and storing the model, first transformation, and second transformation in a memory associated with the metrology tool.
地址 Milpitas CA US