发明名称 |
SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATION OF METROLOGY TOOLS |
摘要 |
A system, method and computer program product are provided for calibrating metrology tools. One or more design-of-experiments wafers is received for calibrating a metrology tool. A set of signals is collected by measuring the one or more wafers utilizing the metrology tool. A first transformation is determined to convert the set of signals to components, and a second transformation is determined to convert a set of reference signals to reference components. The set of reference signals is collected by measuring the one or more wafers utilizing a well-calibrated reference tool. A model is trained based on the reference components that maps the components to converted components, and the model, first transformation, and second transformation are stored in a memory associated with the metrology tool. |
申请公布号 |
US2017045356(A1) |
申请公布日期 |
2017.02.16 |
申请号 |
US201615236334 |
申请日期 |
2016.08.12 |
申请人 |
KLA-Tencor Corporation |
发明人 |
Pandev Stilian Ivanov;Sanko Dzmitry |
分类号 |
G01B21/00 |
主分类号 |
G01B21/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method, comprising:
receiving one or more DoE (design-of-experiments) wafers for calibrating a metrology tool; collecting a set of signals by measuring the one or more DoE wafers utilizing the metrology tool; determining a first transformation to convert the set of signals to components; determining a second transformation to convert a set of reference signals to reference components; training a model, based on the reference components, that maps the components to converted components; and storing the model, first transformation, and second transformation in a memory associated with the metrology tool. |
地址 |
Milpitas CA US |