| 摘要 |
A plasma generator and method are disclosed. The plasma generator is for generating a plasma stream from a gas stream and comprises: a housing configured to receive the gas stream; and a coil located within the housing and operable to generate the plasma stream from the gas stream. Locating the coil within the housing both improves the generation of the plasma stream (which improves the operation of the plasma generator in the treatment of any effluent stream since both capacitively-induced and inductively-induced plasmas are generated) and increases the range of materials from which the housing may be made since the coil is no longer placed outside of the housing, such as materials which are less damaged by reactive gas etching, which results in increased operating life for the chamber. |
