SYSTEMS, METHODS, AND COMPUTER PROGRAMS TO LOCATE PORTIONS OF PATTERNS FOR MEASUREMENT IN SEM IMAGES

摘要

A system can locate patterns for measurement in a captured Scanning Electron Microscope (SEM) image. The system can include a processor circuit that can be configured to generate a target pattern from a layout of a semiconductor device, and configured to generate a virtual image that corresponds to the target pattern, wherein elements of the virtual image less than completely overlap the corresponding portions of the target pattern, and configured to locate portions of a captured SEM image of a fabricated semiconductor device that match the elements of the virtual image.

主权项

1. A method of locating patterns for measurement in a Scanning Electron Microscope (SEM) image, the method comprising:
providing a target image including patterns; generating, from the target image, a virtual image having a line shape; and comparing the target image and the virtual image with an SEM image including the patterns.