POLYGON-BASED GEOMETRY CLASSIFICATION FOR SEMICONDUCTOR MASK INSPECTION

摘要

Disclosed are methods and apparatus for providing feature classification for inspection of a photolithographic mask. A design database for fabrication of a mask includes polygons that are each defined by a set of vertices. Any of the polygons that abut each other are grouped together. Any grouped polygons are healed so as to eliminate interior edges of each set of grouped polygons to obtain a polygon corresponding to a covering region of such set of grouped polygons. Geometric constraints that specify requirements for detecting a plurality of feature classes are provided and used for detecting a plurality of feature classes in the polygons of the design database. The detected features classes are used to detect defects in the mask.

主权项

1. A method for providing feature classification for inspection of a photolithographic mask, the method comprising:
providing a design database for fabrication of a mask, wherein the design database has a plurality of polygons that are each defined by a set of vertices; grouping any of the polygons that abut each other; healing any grouped polygons together so as to eliminate interior edges of each set of grouped polygons to obtain a polygon corresponding to a covering region of such set of grouped polygons; providing geometric constraints that specify requirements for detecting a plurality of feature classes; after the healing is performed on the design database, detecting a plurality of feature classes in the polygons of the design database based on the geometric constraints; and in an inspection of a mask fabricated with the design database, detecting defects based on the detected feature classes in the design database.