| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist composition excellent in terms of line width roughness (LWR) performance, resolution, cross-sectional rectangularity, focal depth, and storage stability.SOLUTION: The provided photoresist composition includes [A] a polymer possessing a structural unit (I) including an acid-dissociable group, [B] a radiation-sensitive acid generator, and [C] a compound expressed by the following formula (1). In the following formula (1), Ris a hydrogen atom or monovalent organic group having 1-20 carbon atoms. X is a single bond, *-COO-, *-OCO-, *-CONR-, *-NRCO-, or *-Ar-CO-. Ris a monovalent linear hydrocarbon group having 1-10 carbon atoms or monovalent alicyclic hydrocarbon group having 4-20 carbon atoms. Ar is an arenediyl group having 6-20 carbon atoms. Ris a monovalent acid-dissociable group. * denotes a site bonded with R. m is an integer of 0 to 2. |
