发明名称 載置台及びプラズマ処理装置
摘要 A mounting table includes a base member, having a rear surface and a front surface facing the rear surface, in which a coolant path is formed, a groove portion having a bottom surface within the base member being annularly formed on the front surface, the base member being divided into a cylindrical inner base member portion positioned at an inner side of the groove portion and an annular outer base member portion positioned at an outer side of the groove portion by the groove portion; an annular focus ring supported by the outer base member portion, the annular focus ring having, at an inner side surface thereof, a protrusion that is protruded radially and inwardly to cover the groove portion; a first heat transfer member provided between the mounting surface and the coolant path; and a second heat transfer member provided between the focus ring and the coolant path.
申请公布号 JP6080571(B2) 申请公布日期 2017.02.15
申请号 JP20130016703 申请日期 2013.01.31
申请人 東京エレクトロン株式会社 发明人 山本 恭平;▲高▼▲瀬▼ 均
分类号 H01L21/683;H01L21/3065 主分类号 H01L21/683
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