发明名称 薄膜トランジスタ用途に用いられる砒化ガリウムに基づく材料
摘要 Embodiments of the invention provide a method of forming a doped gallium arsenide based (GaAs) layer from a solution based precursor. The doped gallium arsenide based (GaAs) layer formed from the solution based precursor may assist solar cell devices to improve light absorption and conversion efficiency. In one embodiment, a method of forming a solar cell device includes forming a first layer with a first type of dopants doped therein over a surface of a substrate, forming a GaAs based layer on the first layer, and forming a second layer with a second type of dopants doped therein on the GaAs based layer.
申请公布号 JP6080167(B2) 申请公布日期 2017.02.15
申请号 JP20130531928 申请日期 2011.09.30
申请人 アプライド マテリアルズ インコーポレイテッドAPPLIED MATERIALS,INCORPORATED 发明人 シン, カウシャル, ケー.;フィッサー, ロバート ヤン;クマール, バスカー
分类号 H01L29/786;H01L21/205;H01L21/208;H01L21/336 主分类号 H01L29/786
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