发明名称 |
Optical waveguide apparatus and method for manufacturing the same |
摘要 |
An optical waveguide apparatus having a very simple structure that can modulate a signal light guided through an optical waveguide is provided. A photoresist 13 is applied to an upper side of an SOI film 12, a photoresist mask 14 is formed, and the SOI film in a region that is not covered with the photoresist mask 14 is removed by etching to obtain an optical waveguide 15 having a single-crystal silicon core. Further, a light emitting device capable of irradiating the single-crystal silicon core with a light having a wavelength of 1.1 µm or below is provided on a back surface side of a quartz substrate 20 to provide an optical waveguide apparatus. When the light emitting device 30 does not apply a light, the light guided through the optical waveguide 15 is guided as it is. However, when the light emitting device 30 applies a light to form each pair of an electron and a hole in the irradiated region 16, the light guided through the optical waveguide 15 is absorbed by the pair of an electron and a hole, thereby enabling switching (modulation) for turning ON/OFF an optical signal depending on presence/absence (ON or OFF) of application of the light from the light emitting device 30. |
申请公布号 |
EP1980884(B1) |
申请公布日期 |
2017.02.15 |
申请号 |
EP20080005515 |
申请日期 |
2008.03.25 |
申请人 |
Shin-Etsu Chemical Company, Ltd. |
发明人 |
Akiyama, Shoji;Kubota, Yoshihiro;Ito, Atsuo;Tanaka, Koichi;Tobisaka, Yuuji;Kawai, Makoto |
分类号 |
G02B6/134;G02B6/12;G02B6/13;G02B6/42;G02F1/01;G02F1/025 |
主分类号 |
G02B6/134 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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