发明名称 |
Controlled crystallization to grow large grain organometal halide perovskite thin film |
摘要 |
A method of forming perovskite thin films with micron-sized perovskite grains is provided. A layer of PbX2 in a solution containing a metal ion additive is applied to a structure. The structure with the PbX2 layer is annealed a first time. The PbX2 is exposed to CH3NH3X in a solvent. The structure with the exposed PbX2 layer is annealed a second time resulting in a CH3NH3PbX3 layer. X is selected from a group consisting of Cl, Br, I, CN, and SCN. |
申请公布号 |
US9570240(B1) |
申请公布日期 |
2017.02.14 |
申请号 |
US201615228112 |
申请日期 |
2016.08.04 |
申请人 |
The United States of America represented by the Secretary of the Air Force |
发明人 |
Durstock Michael F;Bag Santanu |
分类号 |
H01L51/00;H01G9/20;H01L51/42 |
主分类号 |
H01L51/00 |
代理机构 |
AFMCLO/JAZ |
代理人 |
AFMCLO/JAZ ;Figer, Jr. Charles |
主权项 |
1. A method of forming perovskite thin films with micron-sized perovskite grains, the method comprising:
applying a layer of PbX2 in a solution containing a metal ion additive to a structure; annealing the structure with the PbX2 layer a first time; exposing the PbX2 to CH3NH3X in a solvent; and annealing the structure with the exposed PbX2 layer a second time resulting in a CH3NH3PbX3 layer, wherein X is selected from a group consisting of Cl, Br, I, CN, and SCN. |
地址 |
Washington DC US |