发明名称 Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
摘要 A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower surface opposing the substrate and second member disposed at a portion of exposure light optical path surrounding; driving apparatus to move the second member with respect to the first; controlling the driving apparatus so the second member's operation in the substrate first operation movement is between exposure termination and start of a first and second shot regions differently from a second member's operation in the substrate second movement period which is between exposure termination and start of a third and fourth shot regions; first and second shot regions are in the same row contrary to third and fourth shot regions.
申请公布号 US9568828(B2) 申请公布日期 2017.02.14
申请号 US201314047110 申请日期 2013.10.07
申请人 NIKON CORPORATION 发明人 Sato Shinji
分类号 G03B27/32;G03B27/52;G03B27/58;G03F7/20 主分类号 G03B27/32
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. An exposure apparatus that sequentially exposes each of a plurality of shot regions of a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate while moving the substrate in a scanning direction with respect to the exposure light emitted from the emitting surface, the exposure apparatus comprising: a liquid immersion member that comprises a first member and a second member and that is configured to form a liquid immersion space of the liquid, the first member having a first lower surface, the second member having a second upper surface opposing the first lower surface with a gap between the second upper surface and the first lower surface, the second member having a second lower surface; a driving apparatus that is configured to move the second member with respect to the first member; and a controller that is configured to control the driving apparatus, wherein during exposure of the substrate, the liquid immersion space is formed such that a portion of an upper surface of the substrate is covered by the liquid immersion space and such that at least a portion of a gas-liquid interface of the liquid immersion space is formed between the second lower surface of the second member and the upper surface of the substrate, before or after sequential exposures of each of a plurality of shot regions, which are included in a first row on the substrate and are disposed in a direction which intersects with the scanning direction, are performed, shot regions of another row different from the first row are exposed, the controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate which is between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate which is between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in a same row, the third and fourth shot regions being arranged in different rows, and positions of the second member with respect to the optical member are different from each other in the direction which intersects with the scanning direction at start of the first movement period and at start of the second movement period.
地址 Tokyo JP