发明名称 |
Piezoelectric device and method for manufacturing piezoelectric device |
摘要 |
In a method for manufacturing a piezoelectric device while stably achieving strong bonding, a moisture-absorbing layer is formed on a bonding surface side of a piezoelectric single-crystal substrate. The moisture-absorbing layer is allowed to absorb moisture. A binder layer is formed on a bonding surface side of a supporting substrate. The moisture-absorbing layer is placed on the binder layer. A silica precursor in the binder layer is converted into silica through a hydrolysis reaction with moisture in the moisture-absorbing layer. |
申请公布号 |
US9570668(B2) |
申请公布日期 |
2017.02.14 |
申请号 |
US201414183874 |
申请日期 |
2014.02.19 |
申请人 |
Murata Manufacturing Co., Ltd. |
发明人 |
Iwamoto Takashi |
分类号 |
H03H9/02;H01L41/08;H03H3/02;H03H3/08;H01L41/313;H01L41/27 |
主分类号 |
H03H9/02 |
代理机构 |
Keating & Bennett, LLP |
代理人 |
Keating & Bennett, LLP |
主权项 |
1. A piezoelectric device, comprising:
a supporting substrate; a moisture-absorbing layer disposed on the supporting substrate; a piezoelectric thin film disposed on the moisture-absorbing layer; and a silicon oxide layer disposed between the piezoelectric thin film and the moisture-absorbing layer; wherein the moisture-absorbing layer is more hygroscopic than the piezoelectric thin film and the supporting substrate, and is in contact with the silicon oxide layer. |
地址 |
Kyoto JP |