发明名称 Piezoelectric device and method for manufacturing piezoelectric device
摘要 In a method for manufacturing a piezoelectric device while stably achieving strong bonding, a moisture-absorbing layer is formed on a bonding surface side of a piezoelectric single-crystal substrate. The moisture-absorbing layer is allowed to absorb moisture. A binder layer is formed on a bonding surface side of a supporting substrate. The moisture-absorbing layer is placed on the binder layer. A silica precursor in the binder layer is converted into silica through a hydrolysis reaction with moisture in the moisture-absorbing layer.
申请公布号 US9570668(B2) 申请公布日期 2017.02.14
申请号 US201414183874 申请日期 2014.02.19
申请人 Murata Manufacturing Co., Ltd. 发明人 Iwamoto Takashi
分类号 H03H9/02;H01L41/08;H03H3/02;H03H3/08;H01L41/313;H01L41/27 主分类号 H03H9/02
代理机构 Keating & Bennett, LLP 代理人 Keating & Bennett, LLP
主权项 1. A piezoelectric device, comprising: a supporting substrate; a moisture-absorbing layer disposed on the supporting substrate; a piezoelectric thin film disposed on the moisture-absorbing layer; and a silicon oxide layer disposed between the piezoelectric thin film and the moisture-absorbing layer; wherein the moisture-absorbing layer is more hygroscopic than the piezoelectric thin film and the supporting substrate, and is in contact with the silicon oxide layer.
地址 Kyoto JP