发明名称 |
Bipolar transistor |
摘要 |
A semiconductor device comprising a bipolar transistor and a method of making the same. A power amplifier including a bipolar transistor. The bipolar transistor includes a collector including a laterally extending drift region. The also includes a base located above the collector. The bipolar transistor further includes an emitter located above the base. The bipolar transistor also includes a doped region having a conductivity type that is different to that of the collector. The doped region extends laterally beneath the collector to form a junction at a region of contact between the doped region and the collector. The doped region has a non-uniform lateral doping profile. A doping level of the doped region is highest in a part of the doped region closest to a collector-base junction of the bipolar transistor. |
申请公布号 |
US9570546(B2) |
申请公布日期 |
2017.02.14 |
申请号 |
US201514852385 |
申请日期 |
2015.09.11 |
申请人 |
NXP B.V. |
发明人 |
Vanhoucke Tony;Dinh Viet Thanh;Magnee Petrus Hubertus Cornelis;Ivo Ponky;Klaassen Dirk;Al-Sa'di Mahmoud Shehab Mohammad |
分类号 |
H01L29/06;H01L29/66;H03F3/21;H01L29/417;H01L21/324;H01L29/735;H01L29/08;H01L29/36;H01L29/737 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising a bipolar transistor, the bipolar transistor comprising:
a collector including a laterally extending drift region; a base located above the collector; an emitter located above the base; and a doped region having a conductivity type that is different to that of the collector, the doped region extending laterally beneath the collector to form a junction at a region of contact between the doped region and the collector, wherein the doped region has a non-uniform lateral doping profile, and wherein a doping level of the doped region is highest in a part of the doped region closest to a collector-base junction of the bipolar transistor. |
地址 |
Eindhoven NL |