发明名称 Color filter array substrate and liquid crystal display panel
摘要 A color filter array substrate is disclosed. The color filter array substrate includes a glass substrate, a first metal layer, an insulating layer, an active layer, an ohmic contact layer, a second metal layer, a first passivation layer, a color filter layer, a second passivation layer, and a pixel electrode layer. In the color filter layer, channels are formed at locations where color resists overlap, a common electrode line is disposed on the first metal layer corresponding to the channels and a metal line is disposed on the second metal layer corresponding to the channels. The present invention can effectively shield light leakage, and can also increase liquidity of the PI and LCD.
申请公布号 US9568654(B1) 申请公布日期 2017.02.14
申请号 US201514904952 申请日期 2015.08.20
申请人 Shenzhen China Star Optoelectronics Technology Co., Ltd. 发明人 Ye Yanxi
分类号 H01L27/14;G02B5/20;G02F1/1368;H01L27/12;G02F1/1362 主分类号 H01L27/14
代理机构 代理人
主权项 1. A color filter array substrate comprising: a glass substrate; a first metal layer disposed on the glass substrate, the first metal layer comprising a scanning line and a gate of a thin-film FET; an insulating layer disposed on the first metal layer; an active layer disposed on the insulating layer; an ohmic contact layer disposed on both ends of the active layer; a second metal layer disposed on the ohmic contact layer, the second metal layer comprising a data line, the source and the drain of the thin-film FET; a first passivation layer disposed on the second metal layer for isolating the second metal layer and a color filter layer; the color filter layer disposed on the first passivation layer, the color filter layer including, sequentially arranged, a first color resist, a second color resist, and a third color resist; a second passivation layer disposed on the color filter layer for isolating the color filter layer and a pixel electrode layer; and the pixel electrode layer disposed on the second passivation layer; wherein channels are formed at locations where the color resists overlap in the color filter layer, a common electrode line is disposed on the first metal layer corresponding to the channels for achieving light-shielding, and the locations where the color resists overlap are regions where adjacent color resists overlap.
地址 Shenzhen CN