发明名称 |
Displacement measurements using simulated multi-wavelength light sources |
摘要 |
An embodiment of an apparatus for estimating a parameter includes a multi-wavelength electromagnetic source configured to emit electromagnetic radiation beams having multiple wavelengths at a fixed angle relative to an interferometer, the multi-wavelength source having a stabilizer configured to lock each beam to one of a plurality of discrete wavelength ranges. The apparatus also includes the interferometer, which has a fixed reference reflector and a moveable reflecting assembly coupled to a moveable mass, the mass configured to move in response to the parameter. The apparatus further includes a detector configured to detect an interference pattern generated by the interferometer for each beam, and a processor configured to combine the interference patterns and estimate the parameter based on the combined interference pattern. |
申请公布号 |
US9568640(B2) |
申请公布日期 |
2017.02.14 |
申请号 |
US201414486018 |
申请日期 |
2014.09.15 |
申请人 |
BAKER HUGHES INCORPORATED |
发明人 |
Csutak Sebastian;Edwards Carl M. |
分类号 |
G01B9/02;G01L1/24;G01V7/00;G01V1/16;G01V8/12 |
主分类号 |
G01B9/02 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP |
主权项 |
1. An apparatus for estimating a parameter, comprising:
a multi-wavelength electromagnetic source configured to emit electromagnetic radiation beams having multiple wavelengths at a fixed angle relative to an interferometer, the multi-wavelength source having a stabilizer configured to lock each beam to one of a plurality of discrete wavelength ranges; the interferometer including a fixed reference reflector and a moveable reflecting surface coupled to a moveable mass, the moveable reflecting surface facing the fixed reference reflector, the mass configured to move in response to the parameter, the multi-wavelength source configured to emit a plurality of beams at the same fixed angle relative to the interferometer, each of the plurality of beams having a different wavelength; a detector configured to detect an interference pattern generated by the interferometer for each beam, the interference pattern resulting from reflections of a beam between the fixed reference reflector and the movable reflecting surface; and a processor configured to combine the interference patterns and estimate the parameter based on the combined interference pattern. |
地址 |
Houston TX US |