发明名称 Displacement measurements using simulated multi-wavelength light sources
摘要 An embodiment of an apparatus for estimating a parameter includes a multi-wavelength electromagnetic source configured to emit electromagnetic radiation beams having multiple wavelengths at a fixed angle relative to an interferometer, the multi-wavelength source having a stabilizer configured to lock each beam to one of a plurality of discrete wavelength ranges. The apparatus also includes the interferometer, which has a fixed reference reflector and a moveable reflecting assembly coupled to a moveable mass, the mass configured to move in response to the parameter. The apparatus further includes a detector configured to detect an interference pattern generated by the interferometer for each beam, and a processor configured to combine the interference patterns and estimate the parameter based on the combined interference pattern.
申请公布号 US9568640(B2) 申请公布日期 2017.02.14
申请号 US201414486018 申请日期 2014.09.15
申请人 BAKER HUGHES INCORPORATED 发明人 Csutak Sebastian;Edwards Carl M.
分类号 G01B9/02;G01L1/24;G01V7/00;G01V1/16;G01V8/12 主分类号 G01B9/02
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. An apparatus for estimating a parameter, comprising: a multi-wavelength electromagnetic source configured to emit electromagnetic radiation beams having multiple wavelengths at a fixed angle relative to an interferometer, the multi-wavelength source having a stabilizer configured to lock each beam to one of a plurality of discrete wavelength ranges; the interferometer including a fixed reference reflector and a moveable reflecting surface coupled to a moveable mass, the moveable reflecting surface facing the fixed reference reflector, the mass configured to move in response to the parameter, the multi-wavelength source configured to emit a plurality of beams at the same fixed angle relative to the interferometer, each of the plurality of beams having a different wavelength; a detector configured to detect an interference pattern generated by the interferometer for each beam, the interference pattern resulting from reflections of a beam between the fixed reference reflector and the movable reflecting surface; and a processor configured to combine the interference patterns and estimate the parameter based on the combined interference pattern.
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