发明名称 Method for making patterns on the surface of a substrate using block copolymers
摘要 A method for making patterns on the surface of a substrate by graphoepitaxy, includes depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of a substrate; curing the patterns in the resin by producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of statistical copolymer after curing the patterns in the resin; grafting the layer of statistical copolymer onto the patterns in the resin by annealing; and depositing a layer of a block copolymer into the spaces defined by the patterns in the resin after curing the patterns and the grafting of the layer of statistical copolymer.
申请公布号 US9566610(B2) 申请公布日期 2017.02.14
申请号 US201214122576 申请日期 2012.05.18
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS);COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES 发明人 Tiron Raluca;Gaugiran Stéphanie;Chevalier Xavier;Tedesco Serge
分类号 B05D5/00;B81C1/00;H01L21/027;H01L21/033 主分类号 B05D5/00
代理机构 Pillsbury Winthrop Shaw Pittman LLP 代理人 Pillsbury Winthrop Shaw Pittman LLP
主权项 1. Method for making patterns on the surface of a substrate by graphoepitaxy comprising: depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of the substrate; producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of random copolymer after producing the layer of amorphous carbon on the surface of the patterns in the resin; grafting the layer of random copolymer onto the patterns in the resin, between the patterns in the resin and onto sides of the patterns in the resin, by annealing; depositing a layer of block copolymer into spaces defined by the patterns in the resin after the grafting.
地址 Paris FR