发明名称 |
Method for making patterns on the surface of a substrate using block copolymers |
摘要 |
A method for making patterns on the surface of a substrate by graphoepitaxy, includes depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of a substrate; curing the patterns in the resin by producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of statistical copolymer after curing the patterns in the resin; grafting the layer of statistical copolymer onto the patterns in the resin by annealing; and depositing a layer of a block copolymer into the spaces defined by the patterns in the resin after curing the patterns and the grafting of the layer of statistical copolymer. |
申请公布号 |
US9566610(B2) |
申请公布日期 |
2017.02.14 |
申请号 |
US201214122576 |
申请日期 |
2012.05.18 |
申请人 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS);COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES |
发明人 |
Tiron Raluca;Gaugiran Stéphanie;Chevalier Xavier;Tedesco Serge |
分类号 |
B05D5/00;B81C1/00;H01L21/027;H01L21/033 |
主分类号 |
B05D5/00 |
代理机构 |
Pillsbury Winthrop Shaw Pittman LLP |
代理人 |
Pillsbury Winthrop Shaw Pittman LLP |
主权项 |
1. Method for making patterns on the surface of a substrate by graphoepitaxy comprising:
depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of the substrate; producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of random copolymer after producing the layer of amorphous carbon on the surface of the patterns in the resin; grafting the layer of random copolymer onto the patterns in the resin, between the patterns in the resin and onto sides of the patterns in the resin, by annealing; depositing a layer of block copolymer into spaces defined by the patterns in the resin after the grafting. |
地址 |
Paris FR |