REFLECTOR AND SUSCEPTOR ASSEMBLY FOR CHEMICAL VAPOR DEPOSITION REACTOR

摘要

A reactor for chemical vapor deposition is equipped with an IR radiation compensating susceptor assembly that supports one or more semiconductor substrates above linear IR heater lamps arranged in a parallel array. A set of primary IR radiation reflectors beneath the lamps directs IR radiation back toward the susceptor in a pattern selected to provide uniform IR irradiation of the susceptor assembly to thereby uniformly heat the substrates. Secondary IR shield reflectors may be provided in selected patterns on the underside of the susceptor assembly as a fine tuning measure to direct IR radiation away from the assembly in a controlled pattern. The combined IR radiation reflectors have an IR signature that compensates for any non-uniform heating profile created by the linear IR heater lamp array. The heating profile of the lamp array might also be tailored in order to reduce the amount of compensation required to be supplied by the IR reflectors.

主权项

1. A substrate heating apparatus for a MOCVD reactor comprising:
infrared heating lamps disposed in spaced relation to a susceptor, the susceptor carrying at least one substrate for heating by irradiation of the susceptor with infrared light from the lamps; and a plurality of spaced apart infrared reflectors located on an opposite side of the lamps from the susceptor and having a reflective side facing the heating lamps, the reflectors configured to distribute infrared light across the susceptor in a desired pattern selected so as to provide uniform heating of the susceptor and thereby also uniform heating of the at least one substrate carried by the susceptor.