| 发明名称 |
PELLICLE AND PHOTOMASK ASSEMBLY INCLUDING THE SAME |
| 摘要 |
A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask. |
| 申请公布号 |
US2017038676(A1) |
申请公布日期 |
2017.02.09 |
| 申请号 |
US201615155444 |
申请日期 |
2016.05.16 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
JUNG Yong-seok;Jeon Hwan-Chul;Kim Byung-gook;Choi Jae-hyuck;Kwon Sung-won |
| 分类号 |
G03F1/64 |
主分类号 |
G03F1/64 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A pellicle comprising:
a pellicle membrane including a porous film, the porous film including a plurality of nanowires, each of the plurality of nanowires are patterned across one another. |
| 地址 |
Suwon-si KR |
