发明名称 METAL ANALYSIS DURING PHARMACEUTICAL MANUFACTURING
摘要 A system and method for detecting, measuring, and analyzing for metallic impurities in pharmaceutical drugs and compounds utilizes an x-ray fluorescence system. The system and method may be co-located with a pharmaceutical manufacturing process for in-line continuous monitoring of metal impurities. The pharmaceutical products may be in a form selected from a powder, slurry, pill, tablet, and gel.
申请公布号 WO2017024035(A1) 申请公布日期 2017.02.09
申请号 WO2016US45349 申请日期 2016.08.03
申请人 UHV TECHNOLOGIES, INC. 发明人 KUMAR, Nalin;GARCIA, JR., Manuel, Gerardo
分类号 G01N23/207;G01N23/223;G01N33/15 主分类号 G01N23/207
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