发明名称 |
METAL ANALYSIS DURING PHARMACEUTICAL MANUFACTURING |
摘要 |
A system and method for detecting, measuring, and analyzing for metallic impurities in pharmaceutical drugs and compounds utilizes an x-ray fluorescence system. The system and method may be co-located with a pharmaceutical manufacturing process for in-line continuous monitoring of metal impurities. The pharmaceutical products may be in a form selected from a powder, slurry, pill, tablet, and gel. |
申请公布号 |
WO2017024035(A1) |
申请公布日期 |
2017.02.09 |
申请号 |
WO2016US45349 |
申请日期 |
2016.08.03 |
申请人 |
UHV TECHNOLOGIES, INC. |
发明人 |
KUMAR, Nalin;GARCIA, JR., Manuel, Gerardo |
分类号 |
G01N23/207;G01N23/223;G01N33/15 |
主分类号 |
G01N23/207 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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