VARIABLE GAP HARD STOP DESIGN

摘要

A reaction system for processing semiconductor substrates is disclosed. The reaction system includes a susceptor for holding the substrate as well as a baseplate as a part of housing for the reaction system. A pin located on the susceptor can interact with a baseplate feature located on the baseplate to result in a variable gap between the susceptor and the baseplate. The baseplate feature may take the form of a series of steps, a wedge, or a milled-out feature.

主权项

1. A reaction system comprising:
a susceptor configured to hold a substrate for processing; a pin embedded within the susceptor; a baseplate of a reaction region, the baseplate interacting with the susceptor at a periphery of the susceptor; a movement element configured to rotate the susceptor and the substrate; and a baseplate feature located on the baseplate; wherein a gap is formed between the susceptor and the baseplate when the pin contacts the baseplate feature; wherein a size of the gap can be adjusted based upon a location of the pin's contact on the baseplate feature.