发明名称 ANTISTATIC RESIN COMPOSITION
摘要 [Problem] To provide an antistatic resin composition which has excellent transparency, heat resistance and antistatic properties, especially excellent sustainability of antistatic properties, while being free from problems of outgas. [Solution] An antistatic resin composition which contains 100 parts by mass of (A) a polyester resin having the characteristics (a1) and (a2) described below and 7-25 parts by mass of (B) a polyether ester resin having a structural unit derived from an aromatic polyvalent carboxylic acid substituted by a sulfonate group. (a1) When the sum of the structural units derived from polyvalent carboxylic acids is taken as 100% by mole, 90-100% by mole of a structural unit derived from terephthalic acid and 10-0% by mole of a structural unit derived from isophthalic acid are contained. (a2) When the sum of the structural units derived from polyhydric alcohols is taken as 100% by mole, 50-90% by mole of a structural unit derived from 1, 4-cyclohexane dimethanol and 50-10% by mole of a structural unit derived from 2, 2, 4, 4-tetramethyl-1, 3-cyclobutane diol are contained.
申请公布号 WO2017022637(A1) 申请公布日期 2017.02.09
申请号 WO2016JP72211 申请日期 2016.07.28
申请人 RIKEN TECHNOS CORPORATION 发明人 INOMATA Sayuri;KOBAYASHI Wakako
分类号 C08L67/02 主分类号 C08L67/02
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