SIZE DETECTION METHOD FOR PHOTOLITHOGRAPHIC PATTERN

摘要

A size detection method for a photolithographic pattern is used for size detection of a designed photolithographic pattern of an array substrate of a liquid crystal display panel. The method comprises: obtaining a functional layer parameter and a position parameter of a detected pattern (S101); obtaining a thickness profile of the detected pattern according to the functional layer parameter and the position parameter of the detected pattern (S102); obtaining a plane profile of the detected pattern according to the thickness profile of the detected pattern (S103); and performing size detection on the plane profile of the detected pattern (S104). The size detection method for a photolithographic pattern has relatively high detection accuracy, thereby improving the display quality of a corresponding liquid crystal display panel.