发明名称 |
CLOSED-LOOP RESONATOR SILICON GERMANIUM PHOTODETECTOR APPARATUS AND OTHER SEMICONDUCTOR DEVICES INCLUDING CURVED-SHAPE SILICONE GERMANIUM STRUCTURES |
摘要 |
Semiconductor devices, such as photonics devices, employ substantially curved-shaped Silicon-Germanium (SiGe) structures and are fabricated using zero-change CMOS fabrication process technologies. In one example, a closed-loop resonator waveguide-coupled photodetector includes a silicon resonator structure formed in a silicon substrate, interdigitated n-doped well-implant regions and p-doped well-implant regions forming multiple silicon p-n junctions around the silicon resonator structure, and a closed-loop SiGe photocarrier generation region formed in a pocket within the interdigitated n-doped and p-doped well implant regions. The closed-loop SiGe region is located so as to substantially overlap with an optical mode of radiation when present in the silicon resonator structure, and traverses the multiple silicon p-n junctions around the silicon resonator structure. Electric fields arising from the respective p-n silicon junctions significantly facilitate a flow of the generated photocarriers between electric contact regions of the photodetector. |
申请公布号 |
US2017040487(A1) |
申请公布日期 |
2017.02.09 |
申请号 |
US201615332877 |
申请日期 |
2016.10.24 |
申请人 |
Alloatti Luca |
发明人 |
Alloatti Luca |
分类号 |
H01L31/18;H01L31/0312;G02B6/12;H01L31/0224;H01L31/11;G02B6/293;H01L31/0232;H01L31/0352 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
1. A photodetector apparatus, comprising:
a silicon substrate; a first plurality of n-doped well-implant regions formed in the silicon substrate; a second plurality of p-doped well-implant regions formed in the silicon substrate and interdigitated with the first plurality of n-doped well-implant regions so as to form a plurality of silicon p-n junctions; and a curved-shape Silicon Germanium (SiGe) region formed within both the first plurality of n-doped well-implant regions and the second plurality of p-doped well-implant regions such that the plurality of p-n junctions are contiguous with the curved-shaped SiGe region. |
地址 |
Staefa CH |