发明名称 CLEANING COMPOSITION
摘要 This disclosure relates to a composition (e.g., a cleaning and/or stripping composition) containing (a) 0.5 - 25 percent by weight an alkaline compound; (b) 1 - 25 percent by weight an alcohol amine compound; (c) 0.1 - 20 percent by weight a hydroxylammonium compound; (d) 5 - 95 percent by weight an organic solvent; (e) 0.1 - 5 percent by weight a corrosion inhibitor compound; and (f) 2 -25 percent by weight water.
申请公布号 WO2017023677(A1) 申请公布日期 2017.02.09
申请号 WO2016US44423 申请日期 2016.07.28
申请人 FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 发明人 SAKAMURI, Raj;DIMOV, Ognian N.;NAIINI, Ahmad A.;MALIK, Sanjay;DE, Binod B.;REINERTH, William A.
分类号 C11D11/00;C09G1/02;C11D7/32;C11D7/50;H01L21/304 主分类号 C11D11/00
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