| 发明名称 |
EXPOSURE APPARATUS, METHOD FOR PRODUCING DEVICE, AND METHOD FOR CONTROLLING EXPOSURE APPARATUS |
| 摘要 |
A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet. |
| 申请公布号 |
US2017038694(A1) |
申请公布日期 |
2017.02.09 |
| 申请号 |
US201615332509 |
申请日期 |
2016.10.24 |
| 申请人 |
NIKON CORPORATION |
发明人 |
MAGOME Nobutaka;KOBAYASHI Naoyuki |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A liquid immersion exposure apparatus, comprising:
a projection system; a liquid supply inlet; a liquid collection outlet; a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other; a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet; and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet. |
| 地址 |
Tokyo JP |
