发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND |
摘要 |
The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO3−, and an electron-withdrawing group bonds to a β carbon atom with respect to SO3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.; |
申请公布号 |
US2017038679(A1) |
申请公布日期 |
2017.02.09 |
申请号 |
US201615332203 |
申请日期 |
2016.10.24 |
申请人 |
JSR CORPORATION |
发明人 |
TOMIOKA Hiroshi;KIMOTO Takakazu;ASANO Yusuke |
分类号 |
G03F7/004;G03F7/20;G03F7/32;G03F7/40;G03F7/039;C07C321/28;C07D307/00;C07C309/13;C07C309/39;G03F7/16;C07C309/12 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Tokyo JP |