SUBSTRATE PROCESSING DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND RECORDING MEDIUM

摘要

[Problem] To shorten a time required for reducing oxygen concentration in a transfer chamber. [Solution] The present invention is provided with: a transfer chamber wherein a substrate is transferred from a storing container having the substrate stored therein; a purge gas supply mechanism that supplies a purge gas into the transfer chamber; and a pressure control mechanism, which is disposed in an exhaust path for releasing atmosphere from the transfer chamber, and controls pressure in the transfer chamber. The pressure control mechanism has: an exhaust damper that fully opens or fully closes the exhaust path; and an adjustment damper, which is disposed in the exhaust damper, and holds the inside of the transfer chamber at predetermined pressure.